Analysis of Langmuir Probe Characteristics for Measurement of Plasma Parameters in RF Discharge Plasmas

A simple method for measuring RF plasma parameters by means of a DC-biased Langmuir probe is developed. The object of this paper is to ensure the reliability of this method by using the other methods with different principles. First, Langmuir probe current e I response on RF voltage p1 V superimposed to DC p V biased probe was examined in DC plasmas. Next, probe current response of DC biased probe in RF plasmas was studied and compared with the first experiment. The results were confirmed by using an emissive prove method, an ion acoustic wave method, and a square pulse response method. The method using a simple Langmuir probe is useful and convenient for measuring electron temperature e T , electron density e n , time-averaged space potential s0 V , and amplitude of space potential oscillation s1 V in RF plasmas with a frequency of the order of pi pe 10 f f f < < .